Microstructural and corrosion characteristics of tantalum coatings prepared by molten salt electrodeposition

Electrodeposition of Alloys Coatings from Electrolytic Baths Prepared by Recovery of Exhausted Batteries for Corrosion Protection

Microstructure and Corrosion Performance of Silica Coatings on Aluminum Surface Prepared by Plasma Electrolysis Technique

Silica phases were precipitated on aluminum surface by potentiostatic plasma electrolysis technique. Aqueous sodium silicate solutions with different concentrations were used for this purpose. SEM, EDS, XRD, surface profiles and polarization curves were used to study coatings properties. The results showed that the growth of the silica containing phases on aluminum surface was promoted by incre...

COMPARISON OF ELECTRODEPOSITION ASPECTS AND CHARACTERISTICS OFNi-WAND Co-WALLOYNANOCRYSTALLINE COATINGS

Abstract: current densities. Electrochemical impedance spectroscopy (EIS) results showed that the codeposition mechanism oftungsten in Ni-W deposition is the reduction of tungsten oxide which changed to the reduction of tungsten-containingion complexes at higher current densities. In Co-W electrodeposition, the tungsten codeposition takes place viareduction of tungsten oxide, although, the role...

Electrodeposition of Zinc From Low Temperature Molten Salt Electrolyte: Part I-Imidazole And Zinc-Chloride Electrolyte

Our R & D work was focused on the electro deposition of Zinc from imidazole as low temperature molten salt (LTMS) electrolyte with zinc chloride as a supporting salt at <100o C., without required controls from the previous existing non aqueous baths as well additive free system for the zinc deposition. Surface morphological studies and crystallographic orientation results were evaluated.

AgInSe2 thin films prepared by electrodeposition process

In this work, the one step electrodeposition process was used to prepare Ag-In-Se thin films. The films were deposited at room temperature from a bath containing 1-3x10 M AgNO3, 6x10 -2 M InCl3 and 3x10 -2 M of H2SeO3. The KSCN at a concentration of 0.681 M was used as complexing agent. The pH value of the solution was 1.4. Applied potentials to SCE were chosen between -0.3 V and -1.1 V. Films ...